Single crystal silicon mirrors were widely used in high-energy laser system, and the surface accuracy/quality seriously restricted the output of laser system. So, how to improve the manufacturing level of single crystal silicon mirrors was particularly important, especially the polishing level. This work focus ed on the manufacturing requirements of high-load-capacity single crystal silicon mirrors and conducted a detailed study on the evolution of surface accuracy, roughness and absorption in IBF process. For IBF technique, the incident electron voltage was set to 750 eV and the beam incident angle was set to zero degree. The optical surface profile data was obtained through sub-aperture stitching method. After IBF process, the surface accuracy PV of the single crystal silicon cylindrical mirror converged from the initial 469.280 nm to 101.173 nm, and the roughness RMS diminished from 0.626 nm to 0.506 nm, the surface accuracy and quality had been significantly improved. The weak absorption of the optical surface was detected by weak-absorption platform, and absorption results of the mirror increased to a certain extent, from the initial 0.473 ppm to 0.536. The results showed that IBF technique could effectively improve the surface accuracy/quality of single crystal silicon mirror, which was of great significance to improve the performance of high-energy laser system.
Fused silica, as an excellent optical material, was widely used in the fabrication of laser optics applied in short-pulse/high-power laser systems. Fused silica containing structural defects was easy to be destroyed under laser irradiation. Deeply understanding the impact of different structural defects on the damage characteristics was of great significance for improving the laser damage threshold of fused silica optics. This work focused on structural defects including Oxygen Deficiency Center (ODC), Non-Bridging Oxygen Hole Center (NBOHC), E’ center, Peroxy Linkage (POL), Peroxy Radical (PDR), and elaborated on its formation laws in detail. The changes of damage characteristics and optical property of fused silica with different structural defects were calculated by first principle method. Taking E’ center defect as example, the band gap of defective silica was 3.1242 eV while that of β silica was 5.61 eV, which meant that electrons were more likely to cross the band gap under laser irradiation, led to electron avalanche and induced laser damage. Meanwhile, the optical properties of fused silica with different structural defects also showed significant difference. The reflectivity of β silica was 0.045, while that of silica with E’ center defects was 0.0715. Under 355nm laser irradiation, the absorption of β silica was 0 cm-1 while that of E’ center defects was 16600 cm-1, the absorptivity increased significantly. The change of optical properties also increased the probability of laser damage. In this work, certain support could be provided for the laser-damage theory of fused silica, and the relevant results could also provide important reference for suppression of structural defects.
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