Mr. Ichirota Nagahama Profile

Ichirota Nagahama

at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 11 May 2009 Paper

Novel mask qualification methodology with die-to-database wafer inspection system

Yoshinori Hagio, Ichirota Nagahama, Yasuo Matsuoka, Hidefumi Mukai, Koji Hashimoto

Proceedings Volume 7379, 73790V (2009) https://doi.org/10.1117/12.824272

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Lithography, Optical inspection, Scanning electron microscopy, Mask making, Tolerancing, Electron beams

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Proceedings Article | 13 March 2009 Paper

Hotspot management for spacer patterning technology with die-to-database wafer inspection system

Yoshinori Hagio, Ichirota Nagahama, Yasuo Matsuoka, Hidefumi Mukai, Koji Hashimoto

Proceedings Volume 7275, 72750V (2009) https://doi.org/10.1117/12.813648

KEYWORDS: Inspection, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Reactive ion etching, Scanning electron microscopy, Double patterning technology, Photomasks, Wafer inspection

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Proceedings Article | 19 March 2008 Paper

Hot spot management with die-to-database wafer inspection system

Kohji Hashimoto, Satoshi Usui, Kenji Yoshida, Ichirota Nagahama, Osamu Nagano, Yasuo Matsuoka, Yuuichiro Yamazaki, Soichi Inoue

Proceedings Volume 6925, 692517 (2008) https://doi.org/10.1117/12.772563

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Optical lithography, Metals, Optical inspection, Wafer inspection, Lithography, Optical proximity correction, CMOS devices

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Proceedings Article | 24 March 2006 Paper

Mask inspection method using the electron beam inspection system based on projection electron microscopy

Atsushi Onishi, Ichirota Nagahama, Yuichiro Yamazaki, Nobuharu Noji, Toru Kaga, Kenji Terao

Proceedings Volume 6152, 61523N (2006) https://doi.org/10.1117/12.659422

KEYWORDS: Inspection, Silica, Photomasks, Defect inspection, Semiconducting wafers, Silicon, Thin films, Electron beams, Signal detection, Electron microscopy

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Proceedings Article | 10 May 2005 Paper

Electron beam inspection system for semiconductor wafer based on projection electron microscopy: II

Tohru Satake, Nobuharu Noji, Takeshi Murakami, Manabu Tsujimura, Ichirota Nagahama, Yuichiro Yamazaki, Atsushi Onishi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600445

KEYWORDS: Semiconducting wafers, Inspection, Defect detection, Spatial resolution, Scanning electron microscopy, Distortion, Electron beams, Signal detection, Electron microscopy, Neodymium

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Proceedings Article | 24 May 2004 Paper

Electron beam inspection system for semiconductor wafer based on projection electron microscopy

Tohru Satake, Nobuharu Noji, Takeshi Murakami, Manabu Tsujimura, Ichirota Nagahama, Yuichiro Yamazaki, Atsushi Onishi

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536202

KEYWORDS: Inspection, Semiconducting wafers, Electron beams, Signal detection, Optical inspection, Wafer-level optics, Electron microscopy, Spatial resolution, Yield improvement, Imaging systems

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Proceedings Article | 24 May 2004 Paper

Inspection performances of the electron beam inspection system based on projection electron microscopy

Ichirota Nagahama, Atsushi Onishi, Yuichiro Yamazaki, Tohru Satake, Nobuharu Noji

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534909

KEYWORDS: Inspection, Semiconducting wafers, Signal detection, Electron microscopy, Scanning electron microscopy, Projection systems, Defect detection, Image processing, Wafer-level optics, Prototyping

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Proceedings Article | 15 July 2003 Paper

Development of an electron optical system using EB projection optics in reflection mode for EB inspection

Yuichiro Yamazaki, Ichirota Nagahama, Atsushi Onishi

Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485231

KEYWORDS: Semiconducting wafers, Image quality, Projection systems, Inspection, Imaging systems, Distortion, Reflection, Floods, Wafer inspection, Metals

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Showing 5 of 8 publications

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