Mr. Jay Bunt Profile

Jay Bunt

at IBM Corp

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 23 March 2020 Presentation + Paper

Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance

Chris Robinson, Cody Murray, Luciana Meli, Anuja De Silva, Dario Goldfarb, Conor Thomas, Madhana Sunder, Mary Ann Zaitz, Guoda Lian, Yiping Yao, Leo Tai, Jay Bunt, Jim Rosa, Malik Ali, Steven Boettcher, Mark Stalter

Proceedings Volume 11323, 113230P (2020) https://doi.org/10.1117/12.2551612

KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Carbon, Contamination, Calibration, Sensors, Extreme ultraviolet

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years