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Junji Sano
at Toshiba Corp
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Author
Publications (1)
Proceedings Article | 12 November 2024 Presentation + Paper
Atomic layer etching process application to TaO hard-mask etching for next-generation EUV (Extreme-Ultraviolet) photomask fabrication
Naoki Inoue, Junji Sano, Takuo Kikuchi, Yoshie Okamoto, Kazuki Nakazawa, Takashi Miyamoto, Yoshinori Iino, Tomoaki Yoshimori, Masashi Yamage, Sadayuki Jimbo
Proceedings Volume 13216, 1321608 (2024) https://doi.org/10.1117/12.3034284
KEYWORDS: Atomic layer etching, Extreme ultraviolet, Photomasks
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