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Katja Geidel
at Advanced Mask Technology Ctr GmbH & Co KG
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Publications (1)
Proceedings Article | 27 March 2007 Paper
Golden curve method for OPC signature stability control in high MEEF applications
Katja Geidel, Torsten Franke, Stefan Roling, Peter Buck, Martin Sczyrba, Engelbert Mittermeier, Russell Cinque
Proceedings Volume 6520, 652040 (2007) https://doi.org/10.1117/12.712867
KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Metrology, Lithography, Manufacturing, Control systems, Image processing, Etching
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