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Kazuaki Matsui
at Toppan Printing Co Ltd
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Publications (1)
Proceedings Article | 21 November 2023 Poster + Paper
Mask optimization approach for wafer LCDU improvement in ArF lithography
Kenjiro Ichikawa, Itaru Yoshida, Kazuaki Matsui, Yosuke Kojima, Tatsuya Nagatomo, Mitsuharu Yamana
Proceedings Volume 12751, 127511H (2023) https://doi.org/10.1117/12.2688551
KEYWORDS: Semiconducting wafers, Lithography, Error analysis, Printing, Transmittance, Source mask optimization, Wafer testing, Optical proximity correction, Optical lithography, Photomasks
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