This work focuses on the development of a cryogenic optical profilometry system for the measurement of material properties of thin films across a wide temperature range. A cryostat was machined and integrated with a Zygo NewView 600K optical profilometer and vacuum system. Curvature data were taken for a SiNx thin film on a GaAs substrate from 300 K down to 80 K. From the curvature data, the coefficient of thermal expansion was calculated. The cryogenic optical profilometry system was benchmarked with a three beam curvature technique, and demonstrated excellent agreement across the full temperature range from 300 K to 80 K
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