We demonstrate the capabilities of ion-beam lithography (IBL) for the manufacturing of X-ray micro-optics from amorphous materials. The feasibility of rapid and direct milling of microlenses in glass using a Ga+ ion beam is presented in this work. A single lens with curvature radii below 3 μm was produced from microstructure- and artifacts-free materials: borosilicate glass. In addition, the use of IBL to create optics with a complex curved surface with a radius of curvature of less than 3 μm from single crystal silicon has been shown. The new generation of micro-optics from new materials will be in demand for coherent applications at modern diffraction-limited light sources.
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