As the critical dimension (CD) of integrated circuits (ICs) becomes smaller and smaller, traditional optical lithography has a resolution limit due to the light diffraction effect, and surface plasmon lithography (SPL) beyond the diffraction limit developed in recent years is considered to be an alternative method to break through the diffraction limit. However, the fact that transverse magnetic (TM) waves are required to excite surface plasmon polaritons (SPP or SPPs) at the interface between a metal and a dielectric limits the application of surface plasmon lithography in imaging of the two-dimensional patterns in arbitrary shapes into photoresist. As an effective means of expanding existing lithography technology, double exposure (DE) is expected to be an effective means to solve this problem. Taking the advantage of imaging principle of DE, this paper proposes for the first time to apply DE to SPL to improve the imaging quality of SPL and theoretically analyzes the effect of DE on the improvement of SPL patterning in two dimensions. Simulation is performed in commercial software of Comsol Multiphysics 6.0. The simulation result verifies and proves that, in two-dimensional patterning, DE provides better imaging quality than single exposure.
Imaging capability of surface plasma based nano-patterning is discussed in this article. The imaging capabilityof 1:1imaging ratio is the basis, which is different with the interference lithography with the frequency multiplicationontheimage plan. In this article, “Superlens” is discussed. The imaging capability evaluation is based on the rigorouselectromagnetic modelling of Finite Element Method. Theoretical analysis and numerical evaluation are given, detailedimpact evaluation of a variety of important parameters to the imaging capability is presented.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.