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Manabu Yasumoto
at IBM Research - Almaden
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Publications (1)
Proceedings Article | 31 March 2010 Paper
High contact angle fluorosulfonamide-based materials for immersion lithography
Daniel Sanders, Linda Sundberg, Masaki Fujiwara, Yoshiharu Terui, Manabu Yasumoto
Proceedings Volume 7639, 763925 (2010) https://doi.org/10.1117/12.847257
KEYWORDS: Photoresist materials, Polymers, Lithography, Immersion lithography, Semiconducting wafers, Glasses, Photoresist developing, Roads, Water, Interfaces
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