Mark D. Boerema
Applications Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 22 February 2021 Presentation + Paper
M. van Reijzen, M. Boerema, A. Kalinin, H. Sadeghian, C. Bozdog
Proceedings Volume 11611, 116112E (2021) https://doi.org/10.1117/12.2595426

Proceedings Article | 15 March 2006 Paper
B. Streefkerk, J. Mulkens, R. Moerman, M. Stavenga, J. van der Hoeven, C. Grouwstra, R. Bruls, M. Leenders, S. Wang, Y. van Dommelen, M. Boerema, H. Jansen, K. Cummings, M. Riepen, H. Boom, M. Suddendorf, P. Huisman
Proceedings Volume 6154, 61540S (2006) https://doi.org/10.1117/12.660376
KEYWORDS: Particles, Thin film coatings, Semiconducting wafers, Scanners, Curtains, Photoresist processing, Scanning electron microscopy, Immersion lithography, Lithography, Manufacturing

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