Due to higher integration of optical functionality into compact products like augmented reality into Head-Up-Displays (HUD), there is an increasing demand for very thin and large micro-optical films. Classical production techniques like injection molding are not able to deliver the requested quality or part dimensions. Nano-Imprint-Lithography (NIL) can close this gap and provide very thin and at the same time very large micro-optical products. We will show the general approach and examples for different markets with all necessary steps (origination, tooling and NIL-replication) on substrates from 6” x 6” up to max. size of Gen5-Display-Size (1100 x 1300 mm²).
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