Dr. Masahiro Watanabe Profile

Dr. Masahiro Watanabe

Senior Researcher at Hitachi Ltd

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Author

Publications (10)

Proceedings Article | 1 June 2020 Paper

Speckle-based pose estimation for 3D measurement of the featureless environment by two cameras

Hiroshi Higuchi, Hiromitsu Fujii, Atsushi Taniguchi, Masahiro Watanabe, Atsushi Yamashita, Hajime Asama

Proceedings Volume 11515, 115151P (2020) https://doi.org/10.1117/12.2566908

KEYWORDS: Speckle, 3D metrology, Cameras, Environmental sensing, Imaging systems, Motion estimation, Structured light, 3D image processing, Speckle pattern, Light sources

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SPIE Journal Paper | 12 March 2012

Atomic force microscope method for sidewall measurement through carbon nanotube probe deformation correction

Masahiro Watanabe, Shuichi Baba, Toshihiko Nakata, Takafumi Morimoto, Satoshi Sekino, Hiroshi Itoh

JM3, Vol. 11, Issue 1, 011009, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.011009

KEYWORDS: Atomic force microscope, Carbon nanotubes, Atomic force microscopy, Silicon, Calibration, Cadmium, Sensors, Signal detection, Eye, Distortion

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Proceedings Article | 24 March 2009 Paper

AFM method for sidewall measurement through CNT probe deformation correction and its accuracy evaluation

Masahiro Watanabe, Shuichi Baba, Toshihiko Nakata, Hiroshi Itoh, Takafumi Morimoto, Satoshi Sekino

Proceedings Volume 7272, 72721P (2009) https://doi.org/10.1117/12.813375

KEYWORDS: Deconvolution, Atomic force microscopy, Critical dimension metrology, Signal detection, Cerium, Sensors, Silicon, Eye, Calibration, Distortion

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To use atomic force microscope (AFM) to measure dense patterns of 32-nm node structures, there is a difficulty in providing flared probes that go into narrow vertical features. Using carbon nanotube (CNT) probes is a possible alternative. However, even with its extremely high stiffness, van der Waals attractive force from steep sidewalls bends CNT probes. This probe deflection effect causes deformation (or "swelling") of the measured profile. When measuring 100-nm-high vertical sidewalls with a 24-nm-diameter and 220-nm-long CNT probe, the probe deflection can cause a bottom CD bias of 13.5 nm. This phenomenon is inevitable when using long, thin probes whichever scanning method is used. We proposed a method to deconvolve this probe deflection effect. By detecting torsional motion of the base cantilever for the CNT probe, it is possible to estimate the amount of CNT probe deflection. Using this information, we have developed a technique for deconvolving the probe deformation effect from measured profiles. This technique, in combination with deconvolution of the probe shape effect, enables vertical sidewall profile measurement. We have quantitatively evaluated the performance of the proposed method using an improved version of a "tip characterizers" developed at the National Institute of Advanced Industrial Science and Technology (AIST), which has a well-defined high-aspect-ratio line and space structure with a variety of widths ranging from 10 to 60 nm. The critical dimension (CD) values of the line features measured with the proposed AFM method showed good matches to TEMcalibrated CD values. The biases were within a range of ±1.7 nm for combinations of three different probes, five different patterns, and two different threshold heights, which is a remarkable improvement from the bias range of ±4.7 nm with the conventional probe tip shape deconvolution method. The static repeatability was 0.54 nm (3σ), compared to 1.1 nm with the conventional method. Using a 330-nm-deep tip characterizer, we also proved that a 36-nm-narrow groove could be clearly imaged.

Proceedings Article | 22 March 2008 Paper

A novel AFM method for sidewall measurement of high-aspect ratio patterns

Masahiro Watanabe, Shuichi Baba, Toshihiko Nakata, Takafumi Morimoto, Satoshi Sekino

Proceedings Volume 6922, 69220J (2008) https://doi.org/10.1117/12.772712

KEYWORDS: Atomic force microscopy, Deconvolution, Scanning transmission electron microscopy, Silicon, Signal detection, Cerium, Sensors, Distortion, Carbon nanotubes, Calibration

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Proceedings Article | 5 April 2007 Paper

New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond

Manabu Edamura, Yuichi Kunitomo, Takafumi Morimoto, Satoshi Sekino, Toru Kurenuma, Yukio Kembo, Masahiro Watanabe, Shuichi Baba, Kishio Hidaka

Proceedings Volume 6518, 65183M (2007) https://doi.org/10.1117/12.711676

KEYWORDS: Atomic force microscopy, Semiconducting wafers, Metrology, Photoresist materials, Manufacturing, Carbon nanotubes, Chemical mechanical planarization, Sensors, Scanners, Very large scale integration

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Proceedings Article | 5 April 2007 Paper

An advanced AFM sensor: its profile accuracy and low probe wear property for high aspect ratio patterns

Masahiro Watanabe, Shuichi Baba, Toshihiko Nakata, Toru Kurenuma, Yuichi Kunitomo, Manabu Edamura

Proceedings Volume 6518, 65183L (2007) https://doi.org/10.1117/12.711526

KEYWORDS: Sensors, Atomic force microscopy, Digital signal processing, Scanners, Signal processing, Silicon, Carbon, Feedback control, Copper, Nondestructive evaluation

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Design rule shrinkage and wider adoption of new device structures such as STI, copper damascene interconnects, and deep trench structures have made the need for in-line process monitoring of step heights and profiles of device structures more urgent. To monitor active device patterns, as opposed to test patterns as in OCD, AFM is the only non-destructive 3D monitoring tool. The barriers to using AFM in-line monitoring are its slow throughput and the accuracy degradation associated with probe tip wear and spike noise caused by unwanted oscillation on the steep slopes of high-aspect-ratio patterns. Our proprietary AFM scanning method, StepIn^TM mode, is the method best suited to measuring high-aspect-ratio pattern profiles. Because the probe is not dragged on the sample surface as in conventional AFM, the profile trace fidelity across steep slopes is excellent. Because the probe does not oscillate and hit the sample at a high frequency, as in AC scanning mode, this mode is free from unwanted spurious noises on steep sample slopes and incurs extremely little probe tip wear. To take full advantage of the above properties, we have developed an AFM sensor that is optimized for in-line use and produces accurate profile data at high speeds and incurs little probe tip wear. The control scheme we have developed for the AFM sensor, which we call "Advanced StepIn^TM", elaborately analyses the contact force signal, enabling efficient probe tip scanning and a low and stable contact force. With a developed AFM sensor that realizes this concept, we conducted an intensive evaluation on the effect of low and stable contact force scan. Probes with HDC (high density carbon) tips were used for the evaluation. The experiment proves that low contact force enhances the measured profile fidelity by preventing probe tip slip on steep slopes. Dynamics simulation of these phenomena was also conducted, and its results agreed well with the experimental results. The low contact force scan also incurs extremely little probe tip wear, which is essential to assure high measurement repeatability. An inherent property of StepIn^TM is that it causes little probe tip wear because of the minimal contact between tip and sample. The effects of this property have been enhanced by adding low contact force scanning.

Proceedings Article | 24 March 2006 Paper

An advanced AFM sensor for high-aspect ratio pattern profile in-line measurement

Masahiro Watanabe, Shuichi Baba, Toshihiko Nakata, Toru Kurenuma, Hiroshi Kuroda, Takenori Hiroki

Proceedings Volume 6152, 61522A (2006) https://doi.org/10.1117/12.656133

KEYWORDS: Sensors, Atomic force microscopy, Scanners, Digital signal processing, Signal processing, Silicon, Prototyping, Error analysis, Radium, Copper

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Proceedings Article | 14 April 2003 Paper

Sensitivity of convectively coupled modes to basic state: implication for the Madden-Julian oscillation under the Walker circulation

Masahiro Watanabe

Proceedings Volume 4899, (2003) https://doi.org/10.1117/12.466585

KEYWORDS: Convection, Atmospheric modeling, Wave propagation, Atmospheric propagation, Troposphere, Prototyping, Climatology, Planets, Diffusion, Humidity

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Proceedings Article | 19 January 1996 Paper

Real-time computation of depth from defocus

Masahiro Watanabe, Shree Nayar, Minori Noguchi

Proceedings Volume 2599, (1996) https://doi.org/10.1117/12.230388

KEYWORDS: Sensors, Image sensors, Image processing, Calibration, Convolution, Visualization, Computer aided design, Fourier transforms, Spatial resolution, CCD image sensors

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Proceedings Article | 17 May 1994 Paper

Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography

Masahiro Watanabe, Yoshitada Oshida, Yasuhiko Nakayama, Minoru Yoshida, Ryuichi Funatsu, Akira Fujii, Taku Ninomiya

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175490

KEYWORDS: Semiconducting wafers, Photoresist materials, Wafer-level optics, Control systems, Aluminum, Lithography, Modulation, Interferometry, Optical lithography, Beam splitters

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Showing 5 of 10 publications

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