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Masakazu Kato
General Manager at Nissan Chemical Corp
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Publications (3)
Proceedings Article | 16 April 2011 Paper
Development of new Si-contained hardmask for tri-layer process
Makoto Nakajima, Yuta Kanno, Wataru Shibayama, Satoshi Takeda, Masakazu Kato, Takashi Matsumoto
Proceedings Volume 7972, 797225 (2011) https://doi.org/10.1117/12.879357
KEYWORDS: Etching, System on a chip, Chromophores, Photoresist materials, Silicon, Lithography, Reflectivity, Photomasks, Sensors, Plasma etching
Proceedings Article | 12 December 2009 Paper
Bottom-anti-reflective coatings (BARC) for LFLE double patterning process
Rikimaru Sakamoto, Takafumi Endo, Bang-Ching Ho, Shigeo Kimura, Tomohisa Ishida, Masakazu Kato, Noriaki Fujitani, Ryuji Onishi, Yoshiomi Hiroi, Daisuke Maruyama
Proceedings Volume 7520, 75201Y (2009) https://doi.org/10.1117/12.837156
KEYWORDS: Lithography, Double patterning technology, Polymers, Photoresist processing, Chromophores, Scanning electron microscopy, Reflectivity, Thin film coatings, Critical dimension metrology, Immersion lithography
Proceedings Article | 11 April 2006 Paper
Two-layer anti-reflection strategies for implant applications
Douglas Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, Tomoyuki Enomoto
Proceedings Volume 6153, 61530O (2006) https://doi.org/10.1117/12.656528
KEYWORDS: Lithography, Coating, Scanning electron microscopy, Photomicroscopy, Polymers, Bottom antireflective coatings, Semiconducting wafers, Silicon, Control systems, Photoresist processing
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