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Matthieu Piloto
at STMicroelectronics SA
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 1 November 2022 Paper
Mask variability with extraction of SEM image contour and area measurements
Proceedings Volume 12472, 124720B (2022) https://doi.org/10.1117/12.2640124
KEYWORDS: Scanning electron microscopy, Metrology, Photomasks, Calibration, Reliability, Feature extraction, Critical dimension metrology, Matrices, Statistical analysis, Printing
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