Mr. Nobuhiro Takahashi Profile

Nobuhiro Takahashi

at Tokyo Electron Ltd

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Author

Publications (3)

Proceedings Article | 12 April 2007 Paper

Transfer mechanism of defects on topcoat to resist pattern in immersion lithography process and effects on etching process

Nobuhiro Takahashi, Satoru Shimura, Tetsu Kawasaki

Proceedings Volume 6519, 65191Z (2007) https://doi.org/10.1117/12.711281

KEYWORDS: Particles, Photoresist processing, Immersion lithography, Silicon, Process control, Etching, Dry etching, Lithography, Semiconductors, Interfaces

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Proceedings Article | 21 March 2007 Paper

Molecular contamination control technologies for high-volume production phase in high-NA 193-nm lithography

Toshiro Nakano, Takashi Tanahashi, Akihiro Imai, Kazuki Yamana, Tainen Shimotsu, Nobuhiro Takahashi, Masaharu Shioguchi, Yoshitaka Matsuda, Junichi Kitano

Proceedings Volume 6519, 65193I (2007) https://doi.org/10.1117/12.710211

KEYWORDS: Adsorption, Ion exchange, Carbon, Dielectrophoresis, Gases, Ions, Lithography, Semiconductors, Semiconductor manufacturing, 193nm lithography

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Proceedings Article | 29 March 2006 Paper

Molecular contamination control technologies for high NA 193nm lithography

Akihiro Imai, Takashi Tanahashi, Kazuki Yamana, Toshiro Nakano, Nobuhiro Takahashi, Masaharu Shioguchi, Junichi Kitano

Proceedings Volume 6153, 615332 (2006) https://doi.org/10.1117/12.656871

KEYWORDS: Adsorption, Carbon, Photoresist processing, Contamination control, Semiconductors, 193nm lithography, Semiconductor manufacturing, Polymers, Manufacturing, Semiconducting wafers

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