Dr. Piero Spezzigu Profile

Dr. Piero Spezzigu

R&D Engineer at Intraspec Technologies

SPIE Involvement:

Author

Area of Expertise:

Reliability , Photodetectors , Electronic measurements , Failure analysis , Space environment , Electronics Engineering

Publications (4)

Proceedings Article | 12 July 2019 Open Access

Resistance and gain of the microchannel plate (MCP) detector as a function of temperature

O. Chassela, A. Grigoreiv, A. Fedorov, N. André, E Le-Comte, J. Rouzaud, P. Spezzigu

Proceedings Volume 11180, 1118030 (2019) https://doi.org/10.1117/12.2536027

KEYWORDS: Microchannel plates, Resistance, Sensors, Temperature metrology, Particles, Jupiter, Ceramics, Environmental sensing, Chemical species, Electrodes

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The microchannel plate (MCP) has been used for decades as a photon, electron and atoms detector in most of the space instruments dedicated for X-rays, energetic neutral atoms, and charged particle imaging. The deep-space missions, as nearfuture ESA Jupiter Icy moon Explorer (JUICE) mission, expect very low temperature conditions on the destination orbit. Since instruments are usually calibrated on the ground under the “room” temperature, it is very important to know the variation of the detectors properties with temperature. The resistance and the gain of the MCP detectors, dedicated for the JENI (PEP package) instrument onboard of JUICE, were measured as a function of temperature at INTRASPEC TECHNOLOGIES, Toulouse, France for the temperature range -50 to +50°C and at the CALIPSO-3 facility of the Institut de Recherche en Astrophysique et Planétologie (IRAP), Toulouse, France for the temperature range -25 to +25°C using samples from PHOTONIS France and PHOTONIS USA. It is also important to know how the resistance of the MCP detector behaves with temperature either to properly size the high-voltage source or, conversely, to choose a technology according to the size of the MCP detector and the maximum current that the high-voltage source can supply. Since the environment of Jupiter is very severe, the instruments will operate in the presence of high-energy particles that will induce background noise on the MCP detectors due to the shielding of the instruments against radiation. Therefore, the background noise in the Jovian environment represents a crucial issue for the MCP detectors whose gain can be degraded prematurely if too much charge is extracted from them due to the induced particles. Ours measurements show that the resistance of the MCP detector increases when the temperature decreases and is influenced by its self-heating, whereas the gain behavior depends on the technology of the MCPs. This is an important result which can be used to optimize the gain performance and the lifetime of the MCP detector. These experimental tests were funded by the French Space Agency CNES.

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Proceedings Article | 17 November 2017 Open Access

Hyperspectral characterization of fluorescent organic contaminants on optical payloads

Frédéric Bourcier, Robert Pansu, Delphine Faye, Patrice Le Nouy, Piero Spezzigu

Proceedings Volume 10563, 1056348 (2017) https://doi.org/10.1117/12.2304189

KEYWORDS: Luminescence, Molecules, Mirrors, Astronomical imaging, Adhesives, Absorption, Sensors, Ultraviolet radiation, Glasses, Hyperspectral imaging

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Proceedings Article | 27 September 2016 Presentation + Paper

Hyperspectral instrumentation to image and characterize the fluorescence of materials

Frédéric Bourcier, Philippe Walter, Silvia Pedetti, Delphine Faye, Piero Spezzigu, Fulvio Infante, Patrice Le Nouy, Edoardo Zedda

Proceedings Volume 9952, 99520J (2016) https://doi.org/10.1117/12.2235592

KEYWORDS: Luminescence, Hyperspectral imaging, Ultraviolet radiation, Charge-coupled devices, Sensors, Spectroscopy, Prototyping, Prisms, Cadmium sulfide, Cadmium

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Proceedings Article | 26 April 2008 Paper

Silicon phototransistor reliability assessment and new selection strategies for space applications

Piero Spezzigu, Laurent Bechou, Gianandrea Quadri, Olivier Gilard, Yannick Deshayes, Yves Ousten, Massimo Vanzi

Proceedings Volume 7003, 70030O (2008) https://doi.org/10.1117/12.780976

KEYWORDS: Phototransistors, Silicon, Annealing, Reliability, Diffusion, Failure analysis, Manufacturing, Interfaces, Antireflective coatings, Photodiodes

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