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Dr. Qiongyan Yuan
at Shanghai Micro Electronics Equipment Co Ltd
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Publications (1)
Proceedings Article | 21 November 2007 Paper
A novel method for measuring the coma aberration of lithographic projection optics by relative image displacements at multiple illumination settings
Qiongyan Yuan, Xiangzhao Wang, Zicheng Qiu, Fan Wang, Mingying Ma
Proceedings Volume 6827, 68271S (2007) https://doi.org/10.1117/12.766179
KEYWORDS: Monochromatic aberrations, Lithography, Binary data, Projection systems, Phase shifts, Image sensors, Distortion, Diffraction, Lithographic illumination, Diffraction gratings
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