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Ruud Marechal
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 1 April 2009 Paper
Defectivity process optimization on immersion topcoat less resist stacks
Kazuhito Shigemori, Suping Wang, Len Tedeschi, Gazi Tanriseven, Raymond Maas, Coen Verspaget, Ruud Marechal, Ad Lammers, Joerg Mallmann, Masahiko Harumoto, Akihiro Hisai, Masaya Asai
Proceedings Volume 7273, 72732B (2009) https://doi.org/10.1117/12.818745
KEYWORDS: Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Signal attenuation, Printing, Scanners, Particles, Coating, Defect inspection, Digital watermarking
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