In metallic mirror Micro-opto-electro-mechanical system (MOEMS) Fabry Pérot interferometer (FPI) chips, sticking and non-reversible pull-in of the two mirrors is lowering the lifetime of the component. Adding 10 nm of atomic layer deposited (ALD) of semiconducting titanium dioxide (TiO2) coating over the cavity of the mirror decreased the static charge inside the mirror cavity preventing sticking of the mirrors and the mirrors survived actuated to pull-in for more than 1000 times. As too thick layers can optically lower the performance of the mirror and overly thin layers would not decrease the static charge, we studied three different TiO2 thicknesses of 3 nm, 5 nm, and 10 nm. In conclusion, 10 nm TiO2 layer does not optically interfere in the FPI´s performance and it has the best conductivity of all tested TiO2 film thicknesses.
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