CONFERENCE PROCEEDINGS
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Satoshi Watanabe
at Shin-Etsu Chemical Co Ltd
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Publications (3)
Proceedings Article | 17 October 2014 Paper
Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond
T. Faure, A. Zweber, L. Bozano, M. Sanchez, R. Sooriyakumaran, L. Sundberg, Y. Sakamoto, S. Nash, M. Kagawa, T. Isogawa, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, K. Masunaga, S. Watanabe, Y. Kawai, J. Malenfant, R. Bowley
Proceedings Volume 9235, 92350P (2014) https://doi.org/10.1117/12.2069031
KEYWORDS: Etching, Opacity, Switching, SRAF, Dry etching, Critical dimension metrology, Logic, Scanning electron microscopy, Manufacturing, Image resolution
Proceedings Article | 8 November 2012 Paper
Conductive layer for charge dissipation during electron-beam exposures
Luisa Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Tasuku Senna, Thomas Faure
Proceedings Volume 8522, 85220O (2012) https://doi.org/10.1117/12.977181
KEYWORDS: Image quality, Photomasks, Semiconducting wafers, Polymers, Electron beam lithography, Line edge roughness, Image registration, Photoresist processing, Neodymium, Ions
Proceedings Article | 20 March 2012 Paper
Conductive layer for charge dissipation during electron-beam exposures
Luisa Bozano, Ratnam Sooriyakumaran, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Nagarajan Palavesam, Gustavo Gandara Montano
Proceedings Volume 8325, 83250X (2012) https://doi.org/10.1117/12.916756
KEYWORDS: Image quality, Polymers, Semiconducting wafers, Gold, Electron beams, Resistance, Lithography, Chemically amplified resists, Thin film coatings, Neodymium
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