Mr. Sergey Yanovich Profile

Sergey Yanovich

Project Manager at JSC Mikron

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 23 March 2007 Paper

Overcome the challenge of CD-bias with organic bottom anti-reflective coating removal process

S. Yanovich, G. Krasnikov, O. Gushchin

Proceedings Volume 6519, 651934 (2007) https://doi.org/10.1117/12.711661

KEYWORDS: Etching, Photomasks, Ions, Semiconducting wafers, Carbon monoxide, Oxygen, Oxides, Bottom antireflective coatings, Critical dimension metrology, Silicon

Read Abstract +

This paper presents a review of two bottom anti-reflective coating (BARC) removal processes incorporated into subhalfmicron contact etching. They are believed to represent different etching mechanisms. Accuracy of size feature transfer was taken as a primary criterion for comparison of different BARC removal processes. These processes are based on application of glow discharge in the following basic gas mixtures: CF₄+O₂ and CO+O₂. The first process based on CF₄+O₂ gas mixture shows a behavior of neutral etching species model that cause a footing developing during BARC removal. Roughly this may be explained by the continuous direction spectrum of neutral active species movement. The access of active neutral species to the BARC layer is dependant upon the window mask size, resist profile and the thickness of resist layer. The second process based on CO+O₂ gas mixture represents another etching mechanism − ion bombardment induced etching. On contrary to the previous partially isotropic process this one provides anisotropic etching. This is due to stimulating and activating the etching reaction by ion bombardment. Anisotropic features are achieved because of directional ion flux normally to wafer surface. This process is proved to be independent of profile and mask opening size features. Data presented show that process based on CO+O₂ gas mixture provides consistent close to zero CD bias at BARC removal step while CF₄+O₂ gas mixture based process causes negative CD bias with apparent dependence upon the window mask size. Robust results of CO+O₂ process allow one to consider it and its basic etching mechanism to be a mainstream of process development for different applications.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years