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Taiga Fudetani
at AGC Electronics Co Ltd
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Publications (1)
Proceedings Article | 22 November 2023 Presentation
Proposal of novel EUV phase shift mask
Hiroshi Hanekawa, Taiga Fudetani, Takeshi Tomizawa, Yoshiaki Ikuta
Proceedings Volume PC12751, PC127510G (2023) https://doi.org/10.1117/12.2691428
KEYWORDS: Phase shifts, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconductors, Binary data, Lithography, Image resolution, High volume manufacturing
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