Mr. Thomas Cummins Profile

Thomas Cummins

at University College Dublin

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Author

Publications (5)

Proceedings Article | 11 December 2012 Paper

Investigating the effects of laser intensity and pulse duration on 6.7-nm BEUV emission from Gadolinium plasma

Thomas Cummins, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Colm O'Gorman, Padraig Dunne, Emma Sokell, Gerry O'Sullivan, Takeshi Higashiguchi

Proceedings Volume 8678, 86780C (2012) https://doi.org/10.1117/12.2015164

KEYWORDS: Plasma, Picosecond phenomena, Ions, Pulsed laser operation, Gadolinium, Extreme ultraviolet, Nd:YAG lasers, Reflectivity, Time metrology, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2012 Paper

Laser-produced plasma UTA emission in 3-7nm spectral region

Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Colm O'Gorman, Thomas Cummins, Deirdre Kilbane, Padraig Dunne, Gerard O'Sullivan

Proceedings Volume 8322, 83222J (2012) https://doi.org/10.1117/12.916308

KEYWORDS: Plasma, Bismuth, Ions, Extreme ultraviolet, Pulsed laser operation, Picosecond phenomena, Microscopes, Mirrors, X-rays, Tin

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Proceedings Article | 23 March 2012 Paper

A 6.7-nm beyond EUV source as a future lithography source

Takamitsu Otsuka, Bowen Li, Colm O'Gorman, Thomas Cummins, Deirdre Kilbane, Takeshi Higashiguchi, Noboru Yugami, Weihua Jiang, Akira Endo, Padraig Dunne, Gerard O'Sullivan

Proceedings Volume 8322, 832214 (2012) https://doi.org/10.1117/12.916351

KEYWORDS: Extreme ultraviolet, Plasmas, Gadolinium, Pulsed laser operation, Ions, Nd:YAG lasers, Lithography, Tin, EUV optics, Carbon dioxide lasers

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Proceedings Article | 28 September 2011 Paper

Shorter wavelength EUV source around 6.X nm by rare-earth plasma

Takamitsu Otsuka, Deirdre Kilbane, Thomas Cummins, Colm O'Gorman, Padraig Dunne, Gerry O'Sullivan, Weihua Jiang, Akira Endo, Takeshi Higashiguchi, Noboru Yugami

Proceedings Volume 8139, 81390T (2011) https://doi.org/10.1117/12.892897

KEYWORDS: Plasma, Extreme ultraviolet, Gadolinium, Ions, Terbium, Pulsed laser operation, Nd:YAG lasers, Solids, Mirrors, Carbon dioxide lasers

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Proceedings Article | 14 September 2011 Paper

Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging

Bowen Li, Akira Endo, Takamitsu Otsuka, Colm O'Gorman, Thomas Cummins, Tony Donnelly, Deirdre Kilbane, Weihua Jiang, Takeshi Higashiguchi, Noboru Yugami, Padraig Dunne, Gerry O'Sullivan

Proceedings Volume 8139, 81390P (2011) https://doi.org/10.1117/12.892513

KEYWORDS: Plasma, Extreme ultraviolet, Gadolinium, Ions, Carbon dioxide lasers, Pulsed laser operation, Tin, Lithography, Mirrors, Solids

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