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Dr. Thomas Gädda
CTO at PictM Technologies Oy
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Publications (3)
Proceedings Article | 9 April 2024 Presentation + Paper
Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
Luong Nguyen Dang, Li-Ting Tseng, Anil Rajak, Thomas Gädda, Markus Laukkanen, Jagadish Salunke, Shima Moosakkani, Jyri Paulasaari, Juha Rantala, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci
Proceedings Volume 12957, 129570I (2024) https://doi.org/10.1117/12.3014297
KEYWORDS: Electron beam lithography, Solubility, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Polymers, Line width roughness, Photoresist materials, Lithography, Spin on carbon materials
Proceedings Article | 25 March 2019 Paper
Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
Thomas Gädda, Nguyen Dang Luong, Markus Laukkanen, Kimmo Karaste, Oskari Kähkönen, Emilia Kauppi, Dimitrios Kazazis, Yasin Ekinci, Juha Rantala
Proceedings Volume 10960, 109600B (2019) https://doi.org/10.1117/12.2515600
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Electron beam lithography, Line width roughness, Silicon, Line edge roughness, Optical lithography, Coating, Scanning electron microscopy
Proceedings Article | 11 October 2018 Paper
New resist and underlayer approaches toward EUV lithography
Juha Rantala, Thomas Gädda, Markus Laukkanen, Luong Nguyen Dang, Kimmo Karaste, Dimitrios Kazazis, Yasin Ekinci
Proceedings Volume 10809, 108090X (2018) https://doi.org/10.1117/12.2503107
KEYWORDS: Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Electron beam lithography, System on a chip, Coating, Silicon, Line edge roughness, Metals, Line width roughness
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