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Wenhao Pan
at ASML Shenzhen
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Publications (1)
Proceedings Article | 25 May 2022 Presentation + Paper
OPC accuracy improvement through deep-learning based etch model
Weina Shi, Liang Zhu, Yuqian Chen, Jiao Huang, Jinze Wang, Qian Xie, Bilun Zhang, Yunfei Xi, Wenhao Pan, Yuanxia Zheng, Yongfa Fan, Jin Cheng, Yu Zhao, Leiwu Zheng
Proceedings Volume 12056, 1205607 (2022) https://doi.org/10.1117/12.2613926
KEYWORDS: Etching, Process modeling, Data modeling, Performance modeling, Optical proximity correction, Semiconducting wafers, Scanning electron microscopy, Calibration, Model-based design, Metrology
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