Ms. Xia-Li Wang Profile

Xia-Li Wang

at Hefei Univ of Technology

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Proceedings Article | 29 November 2023 Poster + Paper

Near-field enhanced optoelectronic performance of Si thin film

Xia-Li Wang, Bin Li, Qiao-Yue Wu, Ying-Wei Lu

Proceedings Volume 12774, 127740U (2023) https://doi.org/10.1117/12.2686574

KEYWORDS: Absorption, Silicon films, Plasmonics, Near field, Optoelectronics, Electric fields, Tin

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Si thin film is one of the promising candidates in the fields of optoelectronics and photovoltaics. However, its applications have been limited due to its poor optical absorption arising from the limited physical thickness. It has been demonstrated that such situation can be improved by taking advantage of plasmonic materials, which could enhance the optical absorption cross-section of Si through the near-field enhancement effect without increasing its physical thickness. However, embedding configuration is necessary in this case, which makes Ag and/or Au nanostructures are not suitable since they could induce some electrical defects. In this work, β-Sn-nanoparticles, which belong to IV group, have been employed to embed in the Si thin film to obtain composite thin film with better optoelectronic performance than pure Si thin film with same thickness. Both optical characterizations and finite element simulations indicate that such improvement could be attributed to the confined near-field induced by the embedded β-Sn-nanoparticles. This work could pave a way for the development of Si-based optoelectronic and/or photovoltaic devices.

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