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Xuedong Fan
at Shanghai Huali Microelectronics Corp
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Publications (1)
Proceedings Article | 23 March 2020 Paper
An advanced and efficient methodology for process setup and monitoring by using process stability diagnosis in computational lithography
Lijun Chen, Jun Zhu, Xuedong Fan, Haichang Zheng, Xiaolong Wang, Yancong Ge, Yu Zhang, Abhishek Vikram, Guojie Cheng, Hui Wang, Qing Zhang, Wenkui Liao
Proceedings Volume 11328, 113280Z (2020) https://doi.org/10.1117/12.2548377
KEYWORDS: Monochromatic aberrations, Optical lithography, Semiconducting wafers, Scanning electron microscopy, Image processing, Image resolution, Lithography, Computational lithography, Critical dimension metrology, Semiconductors
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