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YoungMi Kim
at ASML
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Publications (1)
Proceedings Article | 23 March 2020 Presentation + Paper
Machine learning techniques for OPC improvement at the sub-5 nm node
Changsoo Kim, Seungjong Lee, Sangwoo Park, No-Young Chung, Jungmin Kim, Narae Bang, Sanghwa Lee, SooRyong Lee, Robert Boone, Pengcheng Li, Jiyoon Chang, Xinxin Zhou, YoungMi Kim, MinSu Oh, Minsung Kim, Rachit Gupta, Jun Ye, Stanislas Baron
Proceedings Volume 11323, 1132317 (2020) https://doi.org/10.1117/12.2551841
KEYWORDS: Data modeling, Optical proximity correction, Performance modeling, Neural networks, Image processing, Machine learning, Lithography, Extreme ultraviolet, Photoresist processing, Statistical modeling
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