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Yuval Bloomberg
at Applied Materials Inc
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Publications (1)
Proceedings Article | 6 December 2004 Paper
Aerial-image-based inspection on subresolution scattering bars
Luke Hsu, C. Lin, Anja Rosenbusch, Yuval Bloomberg, Simon Kurin
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579749
KEYWORDS: Inspection, Photomasks, Scattering, Solids, Semiconducting wafers, Resolution enhancement technologies, Defect detection, Defect inspection, Image enhancement, Light scattering
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