Wafer based precision glass optics manufacturing has been an innovative approach for combining high accuracy with mass production. However, due to the small ratio of thickness and diameter of the glass wafer, deformation and residual stress would be induced for the nonuniform temperature distribution in the glass wafer after molding. Therefore, thermal modelling of the heating system in the wafer based precision glass molding (PGM) process is of great importance in optimizing the heating system and the technique of the process. The current paper deals with a transient thermal modelling of a self-developed heating system for wafer based PGM process. First, in order to investigate the effect of radiation from the surface and interior of the glass wafer, the thermal modeling is simulated with a discrete ordinates radiation model in the CFD software FLUENT. Temperature distribution of the glass wafer obtained from the simulations is then used to evaluate the performance of heating system and investigate some importance parameters in the model, such as interior and surface radiation in glass wafer, thermal contact conductance between glass wafer and molds, thickness to diameter ratio of glass wafer. Finally, structure modification in the molding chamber is raised to decrease the temperature gradient in the glass wafer and the effect is significant.
A novel method is proposed to improve contour accuracy of three-dimensional (3D) microstructure in real-time maskless lithography technique based on a digital micro-mirror device (DMD). In this paper, firstly according to the study of theory and experiment on exposure doses and exposure thickness relation, the spatial distribution of the photo-resist exposure doses was derived, which could predict the resulting 3D contour. Secondly, an equal-arc slicing strategy was adopted, in which arc lengths between adjacent slicing point are kept constant while layer heights become variant. And an equal-arc-mean slicing strategy that takes the average of adjacent layers height was also proposed to further optimize the quality of contour and reduce the contour error on the basis of the equal-arc slicing. Finally, to estimate the validity of the method and as a study case, aspheric micro-lens array were fabricated with proposed method in experiments. Our results showed that the proposed method is feasible for improving and enhancing the 3D microstructure contour accuracy and smoothness.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.