Philips Wafer Stepper: Characterization And Processing Experience

Roel Kramer; Rene Vervoordeldonk; Stefan Wittekoek; Rene Beem; Guido van der Looij

doi:10.1117/12.933565

13 September 1982 Philips Wafer Stepper: Characterization And Processing Experience

Roel Kramer, Rene Vervoordeldonk, Stefan Wittekoek, Rene Beem, Guido van der Looij

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933565
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

The operation of the Philips Wafer stepper and the automated measurement techniques used to characterize it are reviewed. Characterization data in terms of registration accuracy, lens performance and throughput are presented. Finally, our processing experience with this stepper is described.

Citation Download Citation

Roel Kramer, Rene Vervoordeldonk, Stefan Wittekoek, Rene Beem, and Guido van der Looij "Philips Wafer Stepper: Characterization And Processing Experience", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933565

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