EUV sensitizer for resists and spin-on-carbon materials

Takashi Sato; Yuta Togashi; Sachiko Shinjo; Takumi Toida; Takashi Makinoshima; Masatoshi Echigo

doi:10.1117/12.2323096

3 October 2018 EUV sensitizer for resists and spin-on-carbon materials

Takashi Sato, Yuta Togashi, Sachiko Shinjo, Takumi Toida, Takashi Makinoshima, Masatoshi Echigo

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108091X (2018) https://doi.org/10.1117/12.2323096
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

We are developing the EUV sensitizer for resists and Spin-on-Carbon materials. In previous report, we reported that we had developed the novel materials containing the iodine having high EUV absorption ability, and EUV absorption rate proved to be calculable from density and element composition. In this report, we calculated the improvement rate of the EUV absorption rate when materials with high EUV absorption were used for EUV sensitizers. As the result of this, we found that materials with high EUV absorption were useful for EUV sensitizers. Additionally, we will also report on new materials with a high EUV absorption ability.

Citation Download Citation

Takashi Sato, Yuta Togashi, Sachiko Shinjo, Takumi Toida, Takashi Makinoshima, and Masatoshi Echigo "EUV sensitizer for resists and spin-on-carbon materials", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091X (3 October 2018); https://doi.org/10.1117/12.2323096

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