Paper
16 January 2019 Investigation on the compression behavior of polishing lap in continuous polishing
Author Affiliations +
Proceedings Volume 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 108380J (2019) https://doi.org/10.1117/12.2504925
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China
Abstract
The pressure distribution is the most vital to material removal in continuous polishing in which removes the scratches and subsurface damage induced in grinding and lapping. Firstly, the interface response mechanism of the static contact pair is determined by uniaxial compression test. Then, the numerical model of the optics (Φ50mm×5mm ) and polishing lap(Φ80mm×7mm) contact pair is established to acquire the pressure distribution based on elastic contact mechanics. After that,the compression behavior is characterized by the pressure distribution and real contact area (RCA) measured by fujing pressure film. Attempt is made to clarify the figure of optics in continuous polishing.
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Lele Ren, Feihu Zhang, Defeng Liao, Ruiqing Xie, and Shijie Zhao "Investigation on the compression behavior of polishing lap in continuous polishing ", Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108380J (16 January 2019); https://doi.org/10.1117/12.2504925
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KEYWORDS
Polishing

Interfaces

Computer simulations

Analytical research

Mechanics

Photovoltaics

Sensors

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