Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry

Mary G. Moss; Ruth M. Cuzmar; Terry Brewer

doi:10.1117/12.953052

30 January 1989 Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry

Mary G. Moss, Ruth M. Cuzmar, Terry Brewer

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953052
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Polyimides have many desirable properties for use in the microelectronics industry, including ease of application, excellent planarization capability, and good electrical insulating properties. A polyamic acid that is also an imagable resist simplifies processing by eliminating the need for separate resist application and removal steps. Negative-working polyimide resists are quite common, but there are very few examples of positive-working polyimide-based resists. In this paper, we describe a positive polyimide resist which is based upon a diazonaphthoquinone dissolution inhibitor that is standard in the resist industry. The positive polyimide resist described here has high resolution, high heat resistance, and excellent dielectric properties.

Citation Download Citation

Mary G. Moss, Ruth M. Cuzmar, and Terry Brewer "Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953052

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