To address the demand for new chemistry compatibility, reduced defectivity and increased productivity, Entegris has tailored a membrane as part of its OktolexTM family of technologies to address demanding lithography defectivity performance targets. The new membrane is cleaner, more retentive, and has an enhanced non-sieving particle capture capability when compared to a standard Nylon membranes. In an evaluation of the newly developed membrane using 45nm line/space patterning, the new membrane significantly outperformed both UPE and Nylon filters in microbridging defectivity. In addition, the new membrane also achieved baseline significantly faster than the other filters. |
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Particles
Metals
Chemistry
Lithography
Optical lithography
Immersion lithography
Contamination