Model based CAOPC flow for memory chips to improve performance and consistency of RET solutions

Srividya Jayaram; Sherif Hany Mousa; Ashutosh Rathi; Pat LaCour; Zhenguo Zheng; Lei Zhang; Yaobin Feng; Jun Yao

doi:10.1117/12.2551829

23 March 2020 Model based CAOPC flow for memory chips to improve performance and consistency of RET solutions

Srividya Jayaram, Sherif Hany Mousa, Ashutosh Rathi, Pat LaCour, Zhenguo Zheng, Lei Zhang, Yaobin Feng, Jun Yao

Proceedings Volume 11327, Optical Microlithography XXXIII; 1132709 (2020) https://doi.org/10.1117/12.2551829
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Key factors for maximizing yield in a modern semiconductor fab for Memory device manufacturing include wafer critical dimension uniformity and accuracy control. Resolution Enhancement Techniques (RET) solutions for the highly repetitive arrayed memory devices have been driven by the need for perfect geometric consistency without compromising the lithographic quality. Traditionally, both optical proximity correction (OPC) and sub-resolution assist features (SRAFs) insertion for these repetitive cell-array structures have been dealt by applying manual hand-crafted or rule-based methods. But these can be prone to iterative human intervention, long runtimes and sub-par lithographic quality. This work adopts a pattern/property aware approach (PA)2 and cell-array OPC technology that leverage the inherent repetitive and hierarchical structure of the cell-array to ensure the lithographic quality and perfect geometric consistency and symmetry down to the level of feature edges with model-based OPC and rule-based SRAF solutions. The flow also demonstrates a drastic reduction in runtime and turn-around-time to mask tapeouts for the full chip (core and periphery).

Citation Download Citation

Srividya Jayaram, Sherif Hany Mousa, Ashutosh Rathi, Pat LaCour, Zhenguo Zheng, Lei Zhang, Yaobin Feng, and Jun Yao "Model based CAOPC flow for memory chips to improve performance and consistency of RET solutions", Proc. SPIE 11327, Optical Microlithography XXXIII, 1132709 (23 March 2020); https://doi.org/10.1117/12.2551829

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