Co-optimizing DFM enhancements and their impact on layout-induced circuit performance for analog designs

Lynn Wang; Michael Simcoe; Vikas Mehrotra; Gail Katzman; Rais Huda; Zhao Chuan Lee; Janam Bakshi; Ahmed Abdulghany; Uwe Paul Schroeder; Sriram Madhavan

doi:10.1117/12.2551945

23 March 2020 Co-optimizing DFM enhancements and their impact on layout-induced circuit performance for analog designs

Lynn Wang, Michael Simcoe, Vikas Mehrotra, Gail Katzman, Rais Huda, Zhao Chuan Lee, Janam Bakshi, Ahmed Abdulghany, Uwe Paul Schroeder, Sriram Madhavan

Author Affiliations +

Proceedings Volume 11328, Design-Process-Technology Co-optimization for Manufacturability XIV; 113280M (2020) https://doi.org/10.1117/12.2551945
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

A symmetry-aware DFM layout insertion flow for matched circuits is developed for enhancing analog and mixed-signal designs. Pattern capture is used to categorize the matched circuits to unique groups of layout patterns and store them in a pattern database, in which each pattern has an associated group identification, a match location, a region of extent, and a symmetry constraint. Using the stored information in the pattern database, DFM layout insertions are applied to the base pattern and replicated for the symmetric patterns to generate an optimized layout, thus preserving the original symmetry. The impact of the DFM insertions on analog circuit performance was quantified using electronic simulators. The application of symmetry-aware DFM enhancements to analog designs achieves nearly 100% DFM compliance with negligible 0.1-0.2% impact to analog electrical parameters.

Conference Presentation

Citation Download Citation

Lynn Wang, Michael Simcoe, Vikas Mehrotra, Gail Katzman, Rais Huda, Zhao Chuan Lee, Janam Bakshi, Ahmed Abdulghany, Uwe Paul Schroeder, and Sriram Madhavan "Co-optimizing DFM enhancements and their impact on layout-induced circuit performance for analog designs", Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 113280M (23 March 2020); https://doi.org/10.1117/12.2551945

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available