Achievement of an important milestone to realize the EUV-FEL high power light source for future lithograph

Ryukou Kato; Hiroshi Sakai; Kimichika Tsuchiya; Yasunori Tanimoto; Yosuke Honda; Tsukasa Miyajima; Miho Shimada; Norio Nakamura; Hiroshi Kawata

doi:10.1117/12.2573121

20 September 2020 Achievement of an important milestone to realize the EUV-FEL high power light source for future lithograph

Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Norio Nakamura, Hiroshi Kawata

Author Affiliations +

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170R (2020) https://doi.org/10.1117/12.2573121
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

An EUV-FEL is one of the promising candidates for the future high power EUV light source of more than 1 kW. While the design study on the FEL light source has been progressed, a most important milestone should be a real demonstration of the high repetition rate ERL-based FEL light production. In FY2019, a real Mid-Infrared FEL (MIR-FEL) project based on the compact ERL in KEK started and the beam commissioning was started from the beginning of March 2020. At the conference, the present results obtained from the MIR-FEL and the expected remained-study-works on future EUV-FEL will be presented.

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Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Norio Nakamura, and Hiroshi Kawata "Achievement of an important milestone to realize the EUV-FEL high power light source for future lithograph", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170R (20 September 2020); https://doi.org/10.1117/12.2573121

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