Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks

Tod Robinson; Jeff LeClaire; Iacopo Mochi; Ricarda Maria Nebling; Yasin Ekinci; Dimitrios Kazazis

doi:10.1117/12.2601395

23 August 2021 Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks

Tod Robinson, Jeff LeClaire, Iacopo Mochi, Ricarda Maria Nebling, Yasin Ekinci, Dimitrios Kazazis

Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology; 119080O (2021) https://doi.org/10.1117/12.2601395
Event: Photomask Japan 2021, 2021, Online Only

Abstract

In prior work, progress was shown in the systematic characterization of the process space for efficient and effective repair of extreme ultraviolet (EUV) photomasks using an ultrafast (femtosecond) pulsed deep ultraviolet (DUV) laser apparatus. In this work, the full analysis and conclusions, along with any additional test results are shown. This includes an analysis of the impact of laser repair on the phase shift of the multilayer using multiple processes.

Citation Download Citation

Tod Robinson, Jeff LeClaire, Iacopo Mochi, Ricarda Maria Nebling, Yasin Ekinci, and Dimitrios Kazazis "Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080O (23 August 2021); https://doi.org/10.1117/12.2601395

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