Improvement of local CDU by using low speckle imaging

Hyounghwa Jin; Yongwoo Kim; Harim Oh; Jaehyung Jung; Jaewoong Sohn; Woosung Jin; Kangyeol Yun; Hyosung Lee

doi:10.1117/12.2615747

26 May 2022 Improvement of local CDU by using low speckle imaging

Hyounghwa Jin, Yongwoo Kim, Harim Oh, Jaehyung Jung, Jaewoong Sohn, Woosung Jin, Kangyeol Yun, Hyosung Lee

Proceedings Volume 12051, Optical and EUV Nanolithography XXXV; 1205107 (2022) https://doi.org/10.1117/12.2615747
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

Local CD uniformity (LCDU) is being considered as one of key parameter indicators of patterning quality control due to continuous pattern shrinkage and maintaining wafer quality in lithography process. In optical DUV lithography, LCDU has various contributors and they are systematic mask/OPC items, SEM metrology reproducibility, and stochastic effects. In stochastic term, it includes photoresist and speckle contrast. In general, photoresist is considered as the dominant factor in LCDU control, but speckle contrast is drawing attention due to importance of controlling LCDU in new device. Speckle is a light interference effect which causes the non-uniform dose delivery to mask and wafer, and we experimentally confirmed the effect of speckle contrast in several layers. In this paper, we will propose estimated the speckle budget of total LCDU in the target layers through the experiment.

Conference Presentation

Citation Download Citation

Hyounghwa Jin, Yongwoo Kim, Harim Oh, Jaehyung Jung, Jaewoong Sohn, Woosung Jin, Kangyeol Yun, and Hyosung Lee "Improvement of local CDU by using low speckle imaging", Proc. SPIE 12051, Optical and EUV Nanolithography XXXV, 1205107 (26 May 2022); https://doi.org/10.1117/12.2615747

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