Technology development progress of digital scanner

Yoji Watanabe; Yuho Kanaya; Yusuke Saito; Toshiaki Sakamoto; Soichi Owa; Thomas Koo; Rocky Mai; David Tseng; Conrad Sorensen; Hwan Lee; Stephen Renwick; Noriyuki Hirayanagi; Bausan Yuan

doi:10.1117/12.2613902

26 May 2022 Technology development progress of digital scanner

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Thomas Koo, Rocky Mai, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Author Affiliations +

Proceedings Volume 12051, Optical and EUV Nanolithography XXXV; 1205108 (2022) https://doi.org/10.1117/12.2613902
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

Maskless exposure makes possible of individual chip design customization and large area chip fabrication that are impossible with mask exposure. We are developing DUV optical maskless exposure tool named as Digital Scanner (DS) that uses a spatial light modulator as a pattern generator and a DUV solid-state laser as a light source (193 or 248 nm). We will report technology development progress of DS including the latest experimental data. Sub-pixel patterning capability by DS will be presented. Finally, we will discuss on the DS production tool with 248 nm exposure wavelength that are being prepared to release in mid-2020s.

Conference Presentation

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Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Thomas Koo, Rocky Mai, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Noriyuki Hirayanagi, and Bausan Yuan "Technology development progress of digital scanner", Proc. SPIE 12051, Optical and EUV Nanolithography XXXV, 1205108 (26 May 2022); https://doi.org/10.1117/12.2613902

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