Mr. Yuho Kanaya Profile

Yuho Kanaya

at Nikon Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 29 September 2023 Paper

Pixel-based data preparation for digital scanner

Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan, Yuho Kanaya

Proceedings Volume 12915, 129150G (2023) https://doi.org/10.1117/12.2684546

KEYWORDS: Maskless lithography, Direct write lithography, Scanners, Printing, Optical proximity correction, Spatial light modulators, Semiconducting wafers, Photomasks, Raster graphics, Projection systems

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SPIE Journal Paper | 5 June 2023

Development of deep ultraviolet optical maskless exposure tool for advanced lithography

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

JM3, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041403

KEYWORDS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing

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Proceedings Article | 28 April 2023 Presentation + Paper

Expected performance of digital scanner and the potential application for advanced semiconductor fabrication

Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan, Yoji Watanabe

Proceedings Volume 12494, 124940A (2023) https://doi.org/10.1117/12.2657730

KEYWORDS: Semiconducting wafers, Scanners, Optical proximity correction, Optical lithography, Laser scanners, Semiconductors, Printing, Solid state lasers, Fabrication, Chip manufacturing

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Proceedings Article | 1 December 2022 Poster + Paper

Data preparation for digital scanner

Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12293, 122930U (2022) https://doi.org/10.1117/12.2641419

KEYWORDS: Scanners, Data conversion, Photomasks, Spatial light modulators, Optical proximity correction, Raster graphics, Semiconducting wafers, Phase shifts, Deep ultraviolet, Maskless lithography

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Proceedings Article | 26 May 2022 Presentation + Paper

Technology development progress of digital scanner

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Thomas Koo, Rocky Mai, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Proceedings Volume 12051, 1205108 (2022) https://doi.org/10.1117/12.2613902

KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Data conversion, Spatial light modulators, Printing, Deep ultraviolet, Semiconductors, Optical lithography, Solid state lasers

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Proceedings Article | 12 October 2021 Presentation + Paper

Subpixel pattern edge placement controllability of digital scanner

Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Yuho Kanaya, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Proceedings Volume 11855, 1185508 (2021) https://doi.org/10.1117/12.2600898

KEYWORDS: Spatial light modulators, Projection systems, Scanners, Semiconducting wafers, Digital imaging, Image resolution, Raster graphics, Photomasks, Micromirrors

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Proceedings Article | 22 February 2021 Presentation + Paper

Digital scanner, optical maskless exposure tool with DUV solid state laser

Soichi Owa, Hirotaka Kono, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan, Yoji Watanabe

Proceedings Volume 11613, 1161309 (2021) https://doi.org/10.1117/12.2583680

KEYWORDS: Deep ultraviolet, Solid state lasers, Laser scanners, 3D scanning, Spatial light modulators, Semiconducting wafers, Prototyping, Laser optics, Security printing, Printing

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Proceedings Article | 10 March 2010 Paper

Actual performance data analysis of overlay, focus, and dose control of an immersion scanner for double patterning

Kenichi Shiraishi, Shinji Wakamoto, Noriaki Kasai, Hisashi Nishinaga, Yuuki Ishii, Junichi Kosugi, Yuho Kanaya, Yosuke Shirata

Proceedings Volume 7640, 76400A (2010) https://doi.org/10.1117/12.846341

KEYWORDS: Semiconducting wafers, Double patterning technology, Computer programming, Sensors, Interferometers, Servomechanisms, Metrology, Artificial intelligence, Reticles, Overlay metrology

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Proceedings Article | 24 May 2004 Paper

Advanced alignment optical system for DUV scanner

Masahiko Yasuda, Ayako Sugaya, Tadashi Nagayama, Yuho Kanaya, Takahiro Masada

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535083

KEYWORDS: Optical alignment, Wavefront aberrations, Semiconducting wafers, Optics manufacturing, Reflectivity, Scanners, Monochromatic aberrations, Objectives, Wafer-level optics, Deep ultraviolet

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Proceedings Article | 29 April 2004 Paper

Development of customer assistance software for alignment parameter optimization

Shinichi Nakajima, Yuho Kanaya

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536104

KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Signal processing, Error analysis, Software development, Computing systems, Data modeling, Image sensors, Microscopes

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Proceedings Article | 26 June 2003 Paper

Outlier rejection with mixture models in alignment

Yuho Kanaya, Nobutaka Magome, Mengling Li, Taro Sugihara, Shinichi Nakajima, Ayako Sukegawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485385

KEYWORDS: Expectation maximization algorithms, Statistical analysis, Optical alignment, Computer simulations, Particles, Semiconducting wafers, Neodymium, Lithography, Distortion, Visibility

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Proceedings Article | 2 June 2003 Paper

New method to reduce alignment error by optical system

Shinichi Nakajima, Tadashi Nagayama, Yuho Kanaya, Ayako Sugaya, Ayako Sukegawa

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483513

KEYWORDS: Optical alignment, Semiconducting wafers, Monochromatic aberrations, Neodymium, Microscopes, Spatial frequencies, Reflectivity, Chemical mechanical planarization, Phase shifts, Image analysis

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Proceedings Article | 30 July 2002 Paper

Innovative optical alignment technique for CMP wafers

Ayako Sugaya, Tadashi Nagayama, Shinichi Nakajima, Naomasa Shiraishi, Yuho Kanaya

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474475

KEYWORDS: Chemical mechanical planarization, Optical alignment, Semiconducting wafers, Algorithm development, Diffraction, Sensors, Reflectivity, Detection and tracking algorithms, Distortion, Reticles

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Proceedings Article | 22 August 2001 Paper

Improving the measurement algorithm for alignment

Koji Yoshida, Hideo Mizutani, Shinichi Nakajima, Yuho Kanaya, Akira Takahashi

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436780

KEYWORDS: Optical alignment, Overlay metrology, Signal detection, Detection and tracking algorithms, Image processing, Semiconducting wafers, Wavelet transforms, Microscopes, Picosecond phenomena, Algorithm development

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Showing 5 of 14 publications

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