Poster + Paper
24 May 2022 Development of chirp reduction technique for spherical beams interference lithography
Author Affiliations +
Conference Poster
Abstract
This work improves period uniformity over larger-area gratings in a two-spherical beam interference lithography (IL) setup. Using a concave vacuum chuck, we have experimentally demonstrated the modified optical setup to reduce period variation (chirp) on a 4-inch silicon substrate. The change in the grating period is significantly reduced compared with the interference exposure on a flat silicon substrate. Wavefront aberration measurement on a curved exposed substrate showed improved grating linearity.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ratish Rao Nagaraj Rao, Thomas Kämpfe, Frederic Celle, Anton Savchenko, Emilie Gamet, and Yves Jourlin "Development of chirp reduction technique for spherical beams interference lithography", Proc. SPIE 12131, Nanophotonics IX, 121310T (24 May 2022); https://doi.org/10.1117/12.2621360
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KEYWORDS
Lithography

Spherical lenses

Semiconducting wafers

Wavefronts

Fiber lasers

Wavefront aberrations

3D printing

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