PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
This work improves period uniformity over larger-area gratings in a two-spherical beam interference lithography (IL) setup. Using a concave vacuum chuck, we have experimentally demonstrated the modified optical setup to reduce period variation (chirp) on a 4-inch silicon substrate. The change in the grating period is significantly reduced compared with the interference exposure on a flat silicon substrate. Wavefront aberration measurement on a curved exposed substrate showed improved grating linearity.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.