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25 April 2022 Study on the surface flattening of borosilicate glass in chemical mechanical polishing
Xueliang Lv, Zijin Li, Dongzhan Zhou, Fanfan Shen, Qiwei Xu, Qing Li, Rui Liu, Kaiyu Li, Jingming Zheng, You Zhou, Yang Zhang
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Proceedings Volume 12244, 2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022); 1224407 (2022) https://doi.org/10.1117/12.2635202
Event: 2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022), 2022, Guilin, China
Abstract
In order to optimize the surface flatness and roughness of borosilicate glass, this study employs the chemical mechanical polishing technology(CMP) for the surface flattening of borosilicate glass. The polishing characteristics of the sample has been studied by adjusting the process parameters of CMP, including the polishing time, the rotate speed of polishing disk, the rate of polishing liquid flow, and the polishing pressure. And finally, the surface flattening treatment of the sample was realized in the study. The results show that when the process parameters varied, the surface peak-valley value and surface roughness value of the glass shared the similar trend. As the polishing time increased, they decreased rapidly and then gradually stabilized. During the increase of the rotate speed of polishing disk, the rate of polishing liquid flow, and the polishing pressure, they showed a trend of firstly decreasing and then increasing.
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Xueliang Lv, Zijin Li, Dongzhan Zhou, Fanfan Shen, Qiwei Xu, Qing Li, Rui Liu, Kaiyu Li, Jingming Zheng, You Zhou, and Yang Zhang "Study on the surface flattening of borosilicate glass in chemical mechanical polishing", Proc. SPIE 12244, 2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022), 1224407 (25 April 2022); https://doi.org/10.1117/12.2635202
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KEYWORDS
Polishing
Surface finishing
Borosilicate glass
Chemical mechanical planarization
Surface roughness
Corrosion
Glasses
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