High precision grating of waveguide combiner with scanning overlapped phase interference lithography

Shinji Orihara; Takuro Taniguchi; Kentaro Nomoto; Yohei Nawaki; Kazuyuki Tsuruoka

doi:10.1117/12.2668617

16 March 2023 High precision grating of waveguide combiner with scanning overlapped phase interference lithography

Shinji Orihara, Takuro Taniguchi, Kentaro Nomoto, Yohei Nawaki, Kazuyuki Tsuruoka

Proceedings Volume 12449, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) IV; 1244926 (2023) https://doi.org/10.1117/12.2668617
Event: SPIE AR | VR | MR, 2023, San Francisco, California, United States

Conference Poster

Abstract

We achieved the manufacture of diffraction gratings with line edge roughness of less than 3% at 3σ/ave by utilizing a scanning overlapped phase interference lithography (SOPHIL) system. The SOPHIL method consists of two steps. As the first step, a spot fringe pattern generated by two-beam interference is scanned direction along the grid on the wafer. As the second step, the spot is moved just the integer multiple length of its fringe period, then the spot is exposed again over the 1st fringe. In addition, a 2D-EPE waveguide combiner was fabricated using SOPHIL system. Measured MTF was 0.5 at 0.6 cycles/ milliradian.

Citation Download Citation

Shinji Orihara, Takuro Taniguchi, Kentaro Nomoto, Yohei Nawaki, and Kazuyuki Tsuruoka "High precision grating of waveguide combiner with scanning overlapped phase interference lithography", Proc. SPIE 12449, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) IV, 1244926 (16 March 2023); https://doi.org/10.1117/12.2668617

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