Mr. Yohei Nawaki Profile

Yohei Nawaki

at Ushio Inc

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Author

Publications (7)

Proceedings Article | 10 April 2024 Presentation

Interference lithography system consisting high precision pitch control and automatically beam alignment modules

Yohei Nawaki, Kohei Toyoda, Shunta Sugisaki, Shinji Orihara, Toru Nomura, Kentaro Nomoto, Kazuyuki Tsuruoka

Proceedings Volume PC12956, PC129560J (2024) https://doi.org/10.1117/12.3010198

KEYWORDS: Lithography, Automatic alignment, Control systems, Beam controllers, Automatic control, Semiconducting wafers, Optical lithography, Optical alignment, Metrology, Waveguides

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Proceedings Article | 9 April 2024 Poster + Paper

Fabrication process of flexibly patterned grating by interference lithography system with automated beam alignment module

K. Toyoda, Y. Nawaki, R. Yanoshita, S. Orihara, M. Wasamoto, K. Ota, K. Tsuruoka

Proceedings Volume 12956, 129560Q (2024) https://doi.org/10.1117/12.3010691

KEYWORDS: Lithography, Diffraction gratings, Optical gratings, Holography, Semiconducting wafers, Optical alignment, Fabrication, Beam path, Automatic alignment, Image processing

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Proceedings Article | 16 March 2023 Poster + Paper

High precision grating of waveguide combiner with scanning overlapped phase interference lithography

Shinji Orihara, Takuro Taniguchi, Kentaro Nomoto, Yohei Nawaki, Kazuyuki Tsuruoka

Proceedings Volume 12449, 1244926 (2023) https://doi.org/10.1117/12.2668617

KEYWORDS: Waveguides, Lithography, Line edge roughness, Diffraction gratings, Beam combiners

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Proceedings Article | 16 March 2023 Presentation + Paper

Scanning overlapped phase interference lithography system for manufacturing optical waveguide combiner

Yohei Nawaki, Kentaro Nomoto, Shunta Sugisaki, Shinji Orihara, Kazuyuki Tsuruoka

Proceedings Volume 12449, 1244907 (2023) https://doi.org/10.1117/12.2667155

KEYWORDS: Lithography, Waveguides, Semiconducting wafers, Fringe analysis, Optical scanning systems, Diffraction gratings, Manufacturing, Photoresist materials, Scanning electron microscopy, Glasses

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Proceedings Article | 9 September 2019 Presentation + Paper

Forming an ultrathin and lightweight x-ray micropore optics into a single substrate

K. Nomoto, K. Doi, Y. Nawaki, K. Uetsuki, R. Hata, K. Tsuruoka, H. Kodaka, H. Itoh, Y. Harada, Y. Asakawa

Proceedings Volume 11108, 111080P (2019) https://doi.org/10.1117/12.2525562

KEYWORDS: X-rays, X-ray optics, Reflection, Mirrors, Glasses, Surface roughness, Polishing, Etching, X-ray detectors, Annealing

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Proceedings Article | 9 September 2019 Paper

Ultrathin and lightweight lobster eye optics formed into a single flat substrate

K. Doi, K. Nomoto, Y. Nawaki, K. Uetsuki, R. Hata, K. Tsuruoka, H. Kodaka, H. Ito, Y. Harada, Y. Asakawa

Proceedings Volume 11108, 111080V (2019) https://doi.org/10.1117/12.2527945

KEYWORDS: X-rays, Annealing, Magnetism, Optics manufacturing, X-ray optics, Polishing, Reflectivity, Manufacturing, Glasses, Etching

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Proceedings Article | 17 September 2018 Presentation + Paper

Forming an ultrathin and lightweight Wolter type-1 x-ray micropore optics into a single substrate

K. Nomoto, R. Hata, K. Doi, Y. Nawaki, D. Yajima, R. Furuya, K. Shinoda, K. Tsuruoka, H. Kodaka

Proceedings Volume 10760, 107600A (2018) https://doi.org/10.1117/12.2313125

KEYWORDS: X-rays, Mirrors, Reflectivity, Glasses, X-ray optics, Surface roughness, Polishing, Etching, Diffraction, Surface finishing

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In this paper, we propose a new glass Micropore Optics (MPO), which forms a Wolter type-1 optical system into a single glass substrate without bending or alignment. We call this new X-ray condenser mirror as NXCM. In recent years, lightweight and high-productivity X-ray optics have been demanded for small satellite and detector calibration. We aim to develop a high-performance X-ray MPO by applying our fine patterning and design techniques on the basis of semiconductor-based micromachining technologies. Generally, reducing process steps and cutting out error factors make “productivity” and “resolution” better. It has been expected to form a Wolter type-1 optics directly on a base substrate. Therefore, we focused on the process technology using femtosecond laser irradiation and wet etching, which can form arbitrary fine three-dimensional structure in glass substrate, and applied this technology to MPO fabrication. Using this technique, we successfully achieved to form the two-step oblique grooves machining of 1.7 degrees in the primary stage and 5.1 degrees in the secondary stage with groove widths of 20 μm and 40 μm to the flat glass t 0.5 mm. The groove structure was confirmed by cross-sectional image. The surface roughness of the groove side wall serving as the X-ray reflection surface is expected to be improved by the better scanning of femtosecond laser and the magnetic fluid polishing process. Based on the results, we are proceeding with the production of a condenser mirror prototype while optimizing the coating process and polishing process. In this paper, we report the simulation result of focusing performance and the achievement of the fabrication process in consideration of machining accuracy and error factors. With this method, the higher aspect structure is achieved by stacking several substrates in the optical axis direction or the large area structure is achieved by tiling in the plane direction. The various types of optical structure can be considered with this method.

Showing 5 of 7 publications

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