Robust and automated methodology for scanner matching using contour-based analysis

Jean Gabriel Simiz; Romain Alestra; Romain Bange; Julien Ducoté; Florent Dettoni; Pierre Fanton

doi:10.1117/12.2657686

28 April 2023 Robust and automated methodology for scanner matching using contour-based analysis

Jean Gabriel Simiz, Romain Alestra, Romain Bange, Julien Ducoté, Florent Dettoni, Pierre Fanton

Proceedings Volume 12494, Optical and EUV Nanolithography XXXVI; 1249412 (2023) https://doi.org/10.1117/12.2657686
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

To get better and more stable performance in the mix-and-match of scanners in the fab, the matching of the illumination between those scanners is a must-have for HVM ecosystems. “Traditional” methods have been developed throughout the past years to characterize and correct for any dematching of illumination between tools. In the case of a fast growing fab the latter is not viable anymore because the flow is not automated, and the measurement acquisition methods are not robust enough to mitigate long and fastidious manual intervention of the engineers. In the paper, after reminding the legacy method, we will explore the way of using contour-extracting software to improve quality, runtime, and automation of the full analysis flow. The work will be divided in three parts: - Improve data collection quality and get robust measurements - Set an automated flow based on a contour-extraction software for post-treatment of SEM images and contour analysis - Automatize all the flow to decrease the time between test wafer exposure and validation of the matching

Citation Download Citation

Jean Gabriel Simiz, Romain Alestra, Romain Bange, Julien Ducoté, Florent Dettoni, and Pierre Fanton "Robust and automated methodology for scanner matching using contour-based analysis", Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI, 1249412 (28 April 2023); https://doi.org/10.1117/12.2657686

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