EUV single exposure tip-to-tip variability control through PEB process optimization in BEOL layers

Syamashree Roy; Elke Caron; Andreia Santos; Joern-Holger Franke; Jelle Vandereyken; Sandip Halder

doi:10.1117/12.2687558

21 November 2023 EUV single exposure tip-to-tip variability control through PEB process optimization in BEOL layers

Syamashree Roy, Elke Caron, Andreia Santos, Joern-Holger Franke, Jelle Vandereyken, Sandip Halder

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500P (2023) https://doi.org/10.1117/12.2687558
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

This paper explores the effects of optimizing the post-exposure bake (PEB) process on controlling the variability of Tip-To-Tip (T2T) structures within metallization layers. To gauge variability control, we evaluated Local Critical Dimension Uniformity (LCDU) and Global Critical Dimension Uniformity (GCDU) during the After Development Inspection (ADI) phase. Each of the PEB process optimizations had a unique impact on both LCDU and GCDU. The combination of adjusting the PEB temperature and optimizing the PEB chamber environment produced the most favorable results. This led to a notable improvement of 18.4% in LCDU and 20.1% in GCDU, respectively.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Syamashree Roy, Elke Caron, Andreia Santos, Joern-Holger Franke, Jelle Vandereyken, and Sandip Halder "EUV single exposure tip-to-tip variability control through PEB process optimization in BEOL layers", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500P (21 November 2023); https://doi.org/10.1117/12.2687558

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