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29 September 2023 The impact of real curve layout in mask data preparation
Masakazu Hamaji, Toshikazu Hayashi, Aki Shigeta, Rie Funoki, Shuichiro Ohara
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Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150C (2023) https://doi.org/10.1117/12.2687544
Event: Photomask Japan 2023, 2023, Online Only
Abstract
The integration of curvy mask patterns represented by Inverse Lithography Technology (ILT), into Mask Data Preparation (MDP) has been a practical reality due to the emergence of multi-beam mask writers. This has led to a shift in the industry’s focus from approximating curvy patterns with piecewise linear polygons to directly handling the curves themselves to satisfy the requirements of higher fidelity and data volume. To address this challenge, a working group has been organized with the mask industry to extend OASIS format so that curves can be represented directly. This will lead a growing need for direct handling of curves in various stages of MDP. The geometry processing algorithms used in MDP are designed and optimized for Manhattan shape and piecewise linear polygons so that direct handling of curves in such algorithms are challenging and still in an early stage. This study aims to provide insight of the impact of the introduction of curve patterns into MDP through a comparison with the traditional piecewise linear polygon representation.
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Masakazu Hamaji, Toshikazu Hayashi, Aki Shigeta, Rie Funoki, and Shuichiro Ohara "The impact of real curve layout in mask data preparation", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150C (29 September 2023); https://doi.org/10.1117/12.2687544
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KEYWORDS
Tolerancing
Optical proximity correction
Algorithm development
Mathematical optimization
Lithography
Manufacturing
Photomasks
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